検索対象:     
報告書番号:
※ 半角英数字
 年 ~ 
 年
検索結果: 3 件中 1件目~3件目を表示
  • 1

発表形式

Initialising ...

選択項目を絞り込む

掲載資料名

Initialising ...

発表会議名

Initialising ...

筆頭著者名

Initialising ...

キーワード

Initialising ...

使用言語

Initialising ...

発行年

Initialising ...

開催年

Initialising ...

選択した検索結果をダウンロード

論文

Microscopic analyses on Zr adsorbed IDA chelating resin by PIXE and EXAFS

荒井 陽一; 渡部 創; 大野 真平; 野村 和則; 中村 文也*; 新井 剛*; 瀬古 典明*; 保科 宏行*; 羽倉 尚人*; 久保田 俊夫*

Nuclear Instruments and Methods in Physics Research B, 477, p.54 - 59, 2020/08

 被引用回数:5 パーセンタイル:52.81(Instruments & Instrumentation)

Used PUREX process solvent generated from reprocessing process of spent nuclear fuel contains a small amount of U and Pu complexed with tributyl phosphate (TBP) or dibutyl phosphate (DBP). The radioactive nuclides should be removed from the solvent for safety storage or disposal. The iminodiacetic acid (IDA) type chelating resin was proposed as promising procedures for efficient recovery of the trapped cations in the solvent. In order to reveal the distribution and amount of Zr in the particle and local structure of Zr complex formed in the adsorbent, PIXE and EXAFS analyses on the Zr adsorbed chelating resin were carried out. Micro-PIXE analysis proved that it is an effectual method for quantitative analysis of trace adsorbed elements. Moreover, some of the adsorption sites were possibly occupied by the molecules. On the other hand, Zr-K edge EXAFS analysis suggested that extraction mechanism of Zr from the aqueous solution and the solvent was different.

論文

Quantitative analysis of Zr adsorbed on IDA chelating resin using Micro-PIXE

荒井 陽一; 渡部 創; 大野 真平; 野村 和則; 中村 文也*; 新井 剛*; 瀬古 典明*; 保科 宏行*; 久保田 俊夫*

QST-M-23; QST Takasaki Annual Report 2018, P. 59, 2020/03

Radioactive spent solvent waste contains U and Pu is generated from reprocessing process of spent nuclear fuel. The nuclear materials should be removed from the solvent for safety storage or disposal. We are focusing on the nuclear materials recovery from spent solvent using imino diacetic acid (IDA) type chelating resin as a promising method. In order to reveal adsorbed amount of Zr, which is simulated of Pu, Micro-Particle Induced X-ray Emission (PIXE) was carried out. Micro-PIXE analysis succeeded in quantitative analysis on trace amount of adsorbed Zr from simulated spent solvent.

論文

Kinetics of ion exchange in the chelating resin Dowex A-1

松鶴 秀夫; 和達 嘉樹

Bulletin of the Chemical Society of Japan, 48(12), p.3456 - 3459, 1975/12

 被引用回数:8

極低濃度のAg$$^{+}$$,Zn$$^{2}$$$$^{+}$$およびCr$$^{3}$$$$^{+}$$のキレート樹脂Dowex A-1へのイオン交換を、速度論的に一定容積系で研究した。その結果、Ag$$^{+}$$およびZn$$^{2}$$$$^{+}$$の交換速度はイオン強度,樹脂粒度,反応温度に依存すること、律速段階については、高イオン強度(0.1~0.05)では樹脂内拡散であり、低イオン強度(0.01~0.001)では液境膜拡散であることを明らかにした。見かけの活性化エネルギーはAg$$^{+}$$で3.84kcal/mol,Zn$$^{2}$$$$^{+}$$で3.91kcal/molの値が得られた。Cr$$^{3}$$$$^{+}$$の交換速度はイオン強度、樹脂粒度に依存せず一次反応速度式に従う。見かけの活性化エネルギーには15.5kcal/molを得た。以上のことからCr$$^{3}$$$$^{+}$$交換速度の律速段階は、キレート形式反応に律速されると考えた。

3 件中 1件目~3件目を表示
  • 1